Hydrogenated amorphous carbon films prepared by plasma-enhanced chemical-vapor deposition

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Abstract
[[abstract]]Hydrogenated amorphous carbon films have been prepared from CH4,H2, and Ar mixtures by plasma-enhanced chemical-vapor depositions. Films with various physical properties were obtained from different deposition conditions. The deposition parameters varied included H2 flow rates, Ar flow rates, total pressures, substrate temperatures, and power densities. Effects of each deposition parameter on the microstructures and the kinetics involved in the formation of each film are discussed. In addition, relations between deposition conditions, microstructures, and the optical properties are reported.[[fileno]]2020325010007[[department]]材料科學工程學