High-quality ultrathin chemical-vapor-deposited Ta2O5 capacitors prepared by high-density plasma annealing
- 15 February 2004
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 106 (3) , 234-241
- https://doi.org/10.1016/j.mseb.2003.09.030
Abstract
No abstract availableKeywords
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