Photoluminescence excitation spectra of nitrogen-implanted AlxGa1−xAs

Abstract
Photoluminescence excitation spectra have been measured for the nitrogen‐implanted AlxGa1−xAs at 2 °K, because PLE spectroscopy has versatility for ion‐implanted specimens. The results show that the absorption bands due to nitrogen isoelectronic impurities are formed below the Γ1 conduction‐band minimum even in the indirect composition range, while the emission bands due to nitrogen impurities are situated below the X1 conduction‐band minima.