Coating of activated carbon with silicon carbide by chemical vapour deposition
- 31 December 1996
- Vol. 34 (5) , 567-579
- https://doi.org/10.1016/0008-6223(95)00214-6
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Activated carbon as catalyst support: A review of new research resultsPublished by Elsevier ,2003
- Evaluation of Isothermal Chemical Vapor Infiltration with Langmuir‐Hinshelwood Type KineticsJournal of the Electrochemical Society, 1994
- Morphological aspects of silicon carbide chemically vapour-deposited on graphiteJournal of Materials Science, 1991
- The Effect of CH 4 on CVD β ‐ SiC GrowthJournal of the Electrochemical Society, 1990
- Computer Simulation Study on Atmospheric Pressure CVD Process for Amorphous Silicon CarbideJournal of the Electrochemical Society, 1990
- Influence des conditions experimentales du depot de SiC par RCVD sur l'infiltration de substrats de carbone poreuxJournal of the Less Common Metals, 1990
- Growth Characteristics of CVD Beta‐Silicon CarbideJournal of the Electrochemical Society, 1987
- Thermodynamic Analysis and Kinetic Implications of Chemical Vapor Deposition of Sic from Si‐C‐C1‐H Gas SystemsJournal of the American Ceramic Society, 1985
- Growth Characteristics of Alpha-Silicon CarbideJournal of the Electrochemical Society, 1971
- Adsorption of Gases in Multimolecular LayersJournal of the American Chemical Society, 1938