Anodic oxidation as sectioning technique for the analysis of impurity concentration profiles in silicon
- 1 November 1971
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 8 (5) , 359-375
- https://doi.org/10.1016/0040-6090(71)90084-8
Abstract
No abstract availableThis publication has 24 references indexed in Scilit:
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