X-ray diffraction from low-dimensional structures
- 1 November 1993
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 8 (11) , 1915-1934
- https://doi.org/10.1088/0268-1242/8/11/001
Abstract
This review paper presents the applications of X-ray diffraction to routine measurements and the procedures for extending its capabilities of analysis to undertake a detailed structural investigation of low-dimensional structures. The uses and limitations of the familiar double-crystal diffractometer are discussed as are the advantages of 'reciprocal space mapping' with a multiple-crystal diffractometer. In general X-ray diffraction has been used for composition and thickness measurement in low-dimensional structures (LDS) and these aspects are covered, as well as the avoidance of the pitfalls associated with their determination. The possibilities for the use of X-ray diffraction methods to determine interface quality, the evolution of lattice relaxation, the detailed microstructure, etc, are discussed, with an indication of the limits of the techniques.Keywords
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