Material properties of heteroepitaxial yttria-stabilized zirconia films with controlled yttria contents on Si prepared by reactive sputtering
- 1 December 1998
- Vol. 51 (4) , 609-613
- https://doi.org/10.1016/s0042-207x(98)00259-0
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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