Physical and chemical kinetic processes in the CVD of silicon from SiH2Cl2/H2 gaseous mixtures in a vertical cylindrical hot-wall reactor
- 30 September 1991
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 113 (3-4) , 606-632
- https://doi.org/10.1016/0022-0248(91)90097-o
Abstract
No abstract availableKeywords
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