Microstructure of Polysilicon Films Grown by Catalytic Chemical Vapor Deposition Method
- 1 January 1998
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 37 (1R) , 92-93
- https://doi.org/10.1143/jjap.37.92
Abstract
The catalytic chemical vapor deposition (cat-CVD), often called “hot-wire CVD”, is a new method of growing polycrystalline silicon (poly-Si) films at low temperatures. The microstructure of such cat-CVD poly-Si films is investigated by high-resolution transmission electron microscopy. The main microstructural features of these poly-Si films are nanometer-diameter columnar crystalline grains surrounded by a very thin amorphous phase. Good electrical properties, such as large carrier mobilities of the films, may be attributed to this microstructure.Keywords
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