Correlation between structure and properties of reactively deposited Al2O3 coatings by pulsed magnetron sputtering
- 31 October 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 94-95, 303-308
- https://doi.org/10.1016/s0257-8972(97)00341-1
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputteringPublished by Elsevier ,2001
- Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputteringSurface and Coatings Technology, 1996
- Pulsed magnetron sputter technologySurface and Coatings Technology, 1993
- Phase transformation in chemically vapour-deposited κ-aluminaThin Solid Films, 1992
- Space-group determination and structure model for κ-Al2O3 by convergent-beam electron diffraction (CBED)Acta crystallographica Section B, Structural science, crystal engineering and materials, 1991
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Preparation of alumina coatings by chemical vapour depositionThin Solid Films, 1986
- Alumina deposition by activated reactive evaporationThin Solid Films, 1977
- Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2SystemJapanese Journal of Applied Physics, 1972
- Phase Changes in Thin Reactively Sputtered Alumina FilmsJournal of the Electrochemical Society, 1966