Simulation of two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata

1 September 1995

journal article
Published by IOP Publishing in Modelling and Simulation in Materials Science and Engineering

Vol. 3 (5) , 629-642
https://doi.org/10.1088/0965-0393/3/5/004

Abstract

A new algorithm for the simulation if photoresist etching, based on cellular automata, is presented in this paper. The algorithm is fast and robust and has been successfully tested using all known etch-rate distribution test functions. The algorithm performs very well, even in areas where the fluctuation in etch rates is wide and sharp.

Keywords

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