Theoretical and numerical comparison between DMOS and trench technologies for insulated gate bipolar transistors
- 1 July 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 42 (7) , 1356-1366
- https://doi.org/10.1109/16.391221
Abstract
No abstract availableKeywords
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