SiCore-Level Shifts at the Si(001)-SiInterface: A First-Principles Study
- 6 February 1995
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 74 (6) , 1024-1027
- https://doi.org/10.1103/physrevlett.74.1024
Abstract
Using a first-principles approach, we calculate core-level shifts at the Si(001)-Si interface. By fully relaxing interfaces between Si and tridymite, a crystalline form of Si, we obtain interface models with good local structural properties and with no electronic states in the Si gap. Calculated values of Si core-level shifts agree well with data from photoemission experiments and show a linear dependence on the number of nearest-neighbor oxygen atoms. Core-hole relaxation accounts for ∼50% of the total shifts, in good agreement with Auger experiments.
Keywords
This publication has 33 references indexed in Scilit:
- Core-level photoemission and the structure of the Si/SiO2 interface: A reappraisalApplied Physics Letters, 1994
- SiO2/Si(100) interface studied by Al Kα x-ray and synchrotron radiation photoelectron spectroscopyApplied Physics Letters, 1993
- Si/interface: New structures and well-defined model systemsPhysical Review Letters, 1993
- Effect of anisotropic Coulomb field on Si 2pcore levels in oxidized siliconPhysical Review B, 1991
- X-ray scattering studies of the SiO2/Si(001) interfacial structureApplied Physics Letters, 1991
- HRTEM observation of the Si/SiO2 interfaceApplied Surface Science, 1990
- Microscopic structure of the/Si interfacePhysical Review B, 1988
- X-ray scattering studies of the Si-interfacePhysical Review Letters, 1988
- Si→transformation: Interfacial structure and mechanismPhysical Review Letters, 1987
- The localization and crystallographic dependence of Si suboxide species at the SiO2/Si interfaceJournal of Applied Physics, 1987