Improving BiCMOS technologies using BJT parametric mismatch characterisation
- 1 January 2003
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 45 (10889299) , 163-170
- https://doi.org/10.1109/bipol.2003.1274959
Abstract
Why and how can parametric mismatch studies help to improve IC-technologies? After an introduction on the importance of parametric mismatch for performance and yield of mixed-signal as well as digital technologies, the basic terminology and techniques for BJT mismatch fluctuation assessment are reviewed. Two examples are discussed to demonstrate how parametric mismatch fluctuation studies help to improve better device architecture of poly-emitter BJTs. The ensuing process refinements result in better circuit functionality as well as yield improvements.Keywords
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