Proton beam micromachining on strippable aqueous base developable negative resist
- 1 April 2005
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 231 (1-4) , 423-427
- https://doi.org/10.1016/j.nimb.2005.01.094
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- Proton beam micromachining on PMMA, Foturan and CR-39 materialsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2003
- Three-dimensional nanolithography using proton beam writingApplied Physics Letters, 2003
- Nickel and copper electroplating of proton beam micromachined SU-8 resistMicrosystem Technologies, 2002
- Strippable aqueous base developable negative photoresist for high aspect ratio micromachiningMicroelectronic Engineering, 2002
- Resist materials for proton micromachiningNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1999
- Micromachining of silicon with a proton microbeamNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1999
- Focused high energy proton beam micromachining: A perspective viewNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1999
- Micromachining using deep ion beam lithographyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
- Micromachining applications of a high resolution ultrathick photoresistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- MeV ion beam lithography of PMMANuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993