Dual-ion-beam sputtering technique for the production of hydrogenated amorphous silicon
- 1 October 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 120 (3) , 215-222
- https://doi.org/10.1016/0040-6090(84)90297-9
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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