Radio frequency, microwave, and electron cyclotron resonance ion sources for industrial applications: A review (invited)

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Abstract
We recall the different classes of electromagnetic field excited ion sources and their characteristic features in the scope of industrial applications. Emphasis is laid on various criteria and conditions: long source lifetimes, intense inert or reactive ion beams free from contaminants, low process pressures, severe environmental conditions, reliability, possibility of automatic control, simplicity in handling, and maintenance. Examples of sources particularly suited to processes involving deposition or surface modification of materials are reviewed. Specific technological solutions and designs applied to these sources for industrial applications are examined. A few examples of applications using ion-beam processes in different fields (optics, microelectronics, and mechanics) are presented and further trends, especially for inline surface treatments, are examined.