Role of kinetic energy of sputtered particles in thinfilm formation
- 31 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 164-170
- https://doi.org/10.1016/s0040-6090(05)80024-0
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Structures and properties of chromium thin films prepared by anisotropic-emission-effect sputter depositionJournal of Applied Physics, 1990
- Energetic particle bombardment of films during magnetron sputteringJournal of Vacuum Science & Technology A, 1989
- Stress-related effects in thin filmsThin Solid Films, 1989
- Transparent carbon film prepared by mass-separated negative-carbon-ion-beam depositionJournal of Applied Physics, 1987
- Effect of energetic neutralized noble gas ions on the structure of ion beam sputtered thin metal filmsJournal of Vacuum Science & Technology A, 1987
- Inhomogeneous indium tin oxide films prepared by sputtering with multiple targetsThin Solid Films, 1983
- Internal stresses in metallic films deposited by cylindrical magnetron sputteringThin Solid Films, 1979
- Sputtering of an AgAu alloy by bombardment with 6 keV Xe+ionsJournal of Physics D: Applied Physics, 1978
- Germanium and Silicon Film Growth by Low-Energy Ion Beam DepositionJapanese Journal of Applied Physics, 1977
- Fundamentals of Ion PlatingJournal of Vacuum Science and Technology, 1973