Proton nuclear magnetic resonance study on hydrogen incorporation in amorphous-microcrystalline mixed-phase hydrogenated silicon

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Abstract
The behavior of hydrogen in the amorphous-microcrystalline mixed-phase hydrogenated silicon (μc-Si:H) deposited by glow-discharge (GD) decomposition of SiH4 has been characterized by 1H NMR. The 1H spectra consist of two components with different linewidths. The full width at half maximum (FWHM) of the narrow component is about 0.5 kHz at a resonance frequency of 90 MHz, which is much narrower than that has been observed in GD hydrogenated amorphous silicon (a-Si:H) deposited under a conventional low rf power condition. It has been demonstrated that the 0.5-kHz FWHM component originates from the hydrogens in motional narrowing state, and such fast-moving hydrogens are incorporated both in μc-Si:H and high-power deposited a-Si:H. It has also been indicated through annealing study in vacuo that the moving hydrogen has different natures between μc-Si:H and high-power deposited a-Si:H.