Reversible positive charge annealing in MOS transistor during variety of electrical and thermal stresses
- 1 June 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 43 (3) , 805-809
- https://doi.org/10.1109/23.510716
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Time dependence of switching oxide trapsIEEE Transactions on Nuclear Science, 1994
- The role of border traps in MOS high-temperature postirradiation annealing responseIEEE Transactions on Nuclear Science, 1993
- Experimental evidence of two species of radiation induced trapped positive chargeIEEE Transactions on Nuclear Science, 1993
- New insights into radiation-induced oxide-trap charge through thermally-stimulated-current measurement and analysis (MOS capacitors)IEEE Transactions on Nuclear Science, 1992
- The nature of the trapped hole annealing processIEEE Transactions on Nuclear Science, 1989
- Noise in solid-state microstructures: A new perspective on individual defects, interface states and low-frequency (1/ƒ) noiseAdvances in Physics, 1989
- Mosfet and MOS Capacitor Responses to Ionizing RadiationIEEE Transactions on Nuclear Science, 1984
- Physical Mechanisms Contributing to Device "Rebound"IEEE Transactions on Nuclear Science, 1984
- Point Defects in Semiconductors IPublished by Springer Nature ,1981