Enhanced deposition rate of d.c. reactively sputtered TiO2 films by means of low-frequency modulation of the discharge current
- 1 December 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 97 (1-3) , 574-581
- https://doi.org/10.1016/s0257-8972(97)00177-1
Abstract
No abstract availableKeywords
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