Characterization of Epitaxially Grown CeO2(110) Layers on Si by Means of Shadowing Pattern Imaging with Fast Ion Beams

Abstract
Shadowing pattern imaging using keV secondary electrons induced by 56 MeV O8+ ions has been applied to investigate the texture structure of epitaxially grown CeO2(100) layers on Si(100) substrates. The observed shadowing pattern is characteristic of the crystal with a domain structure, i. e., a clear axial image and smeared planar images, which result from the overlapping of two kinds of planar patterns (one is rotated 90° from the other around the axis). The results are consistent with the observations by high-resolution secondary electron microscopy and reflection high-energy electron diffraction.