Line resolution in the sub-ten-nanometer range in SAM
- 31 December 1988
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 25 (1) , 31-34
- https://doi.org/10.1016/0304-3991(88)90403-2
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Auger signal‐to‐background ratio for incident beam voltages ranging from 30 keV up to 100 keVSurface and Interface Analysis, 1988
- High spatial resolution Auger linescans across heterogeneous chemical edges by Monte Carlo calculationSurface and Interface Analysis, 1985
- Mathematical and physical considerations on the spatial resolution in scanning Auger electron microscopySurface Science, 1983
- Techniques for the correction of topographical effects in scanning Auger electron microscopyJournal of Applied Physics, 1983
- The interpretation of the spatial resolution of the scanning Auger electron microscope: A theory/experiment comparisonSurface Science, 1979
- The effect of backscattered electrons on the resolution of scanning Auger microscopySurface Science, 1978
- Monte Carlo calculations of the spatial resolution in a scanning auger electron microscopeSurface Science, 1978
- Auger electron spectroscopy at high spatial resolution and nA primary beam currentsJournal of Vacuum Science and Technology, 1975
- Auger Electron Spectroscopy in the Scanning Electron Microscope: Auger Electron ImagesApplied Physics Letters, 1971