One-step lithography for various size patterns with a hybrid mask-mold
- 1 May 2004
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 71 (3-4) , 288-293
- https://doi.org/10.1016/j.mee.2004.01.042
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Multistep profiles by mix and match of nanoimprint and UV lithographyMicroelectronic Engineering, 2001
- Characterization and application of a UV-based imprint techniqueMicroelectronic Engineering, 2001
- A contribution to the flow behaviour of thin polymer films during hot embossing lithographyMicroelectronic Engineering, 2001
- Pattern formation in hot embossing of thin polymer filmsNanotechnology, 2001
- Flow behaviour of thin polymer films used for hot embossing lithographyMicroelectronic Engineering, 2000
- Nanoimprint- and UV-lithography: Mix&Match process for fabrication of interdigitated nanobiosensorsMicroelectronic Engineering, 2000
- Problems of the nanoimprinting technique for nanometer scale pattern definitionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Imprint Lithography with 25-Nanometer ResolutionScience, 1996
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995