Unambiguous determination of crystal-lattice strains in epitaxially grown SiGe/Si multilayers

Abstract
A new method for unambiguous reconstruction of crystal-lattice strains in epitaxially grown layers from high-resolution x-ray diffraction data is proposed. The technique uses x-ray diffracted intensity profiles collected for two different radiation wavelengths. We enhance the theory for the previously developed algorithm for model-independent determination of crystal-lattice strain profiles in single crystals with epitaxially grown top-surface layers. The method relies on the retrieval of the scattered x-ray wave phase from its intensity profile via a logarithmic Hilbert transform. This phase-retrieval technique is always associated with the problem of complex polynomial root finding. A practical procedure for the mapping of complex polynomial roots is proposed to distinguish true and virtual zeros. This allows the phase of the diffracted x-ray wave to be retrieved unambiguously. The method was applied to determine physical dimensions and concentration composition of a Si/Si1−xGex/Si alloy multilayer structure typical for SiGe heterobipolar transistor device.