Determination of interface state density especially at the band edges by noise measurements on MOSFETs
- 31 October 1987
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 30 (10) , 1013-1015
- https://doi.org/10.1016/0038-1101(87)90092-x
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Flicker (1/f) noise generated by a random walk of electrons in interfacesIEEE Transactions on Electron Devices, 1987
- 1/f noise in n-channel silicon-gate MOS transistorsIEEE Transactions on Electron Devices, 1982
- Experimental results on fast surface states and 1/ f noise in m.o.s. transistorsElectronics Letters, 1975
- 1f Noise in silicon diodesSolid-State Electronics, 1973
- Self-Consistent Results for-Type Si Inversion LayersPhysical Review B, 1972
- Characterization of low 1/f noise in MOS transistorsIEEE Transactions on Electron Devices, 1971
- Noise Observed on Semiconductor SurfacesPhysical Review Letters, 1969
- Low frequency noise in MOS transistors—I TheorySolid-State Electronics, 1968
- Derivation of 1ƒ noise in silicon inversion layers from carrier motion in a surface bandSolid-State Electronics, 1968
- Evidence of the Surface Origin of theNoisePhysical Review Letters, 1966