Micromachining using focused ion beams
- 16 November 1994
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 146 (1) , 523-535
- https://doi.org/10.1002/pssa.2211460143
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Low-energy ion optical system with a liquid-metal ion source for imaging and processing solid structuresUltramicroscopy, 1993
- Focused ion beam induced deposition and ion milling as a function of angle of ion incidenceJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Localized fabrication of Si nanostructures by focused ion beam implantationApplied Physics Letters, 1992
- Modeling of sputtering and redeposition in focused-ion-beam trench millingJournal of Vacuum Science & Technology A, 1991
- Micromachining and Device Transplantation Using Focused Ion BeamJapanese Journal of Applied Physics, 1990
- FIB-Assisted Cl 2 Gas Etching of GaAsPublished by SPIE-Intl Soc Optical Eng ,1989
- Microfocused ion beam applications in microelectronicsApplied Surface Science, 1989
- Fabrication of one-dimensional GaAs wires by focused ion beam implantationJournal of Vacuum Science & Technology B, 1988
- Ion-Channelling Effects In Scanning Microscopy And Ion Beam Writing With A 60 keV Ga+ ProbePublished by SPIE-Intl Soc Optical Eng ,1982
- Note on the design of the cylindrical mirror energy analyserJournal of Physics E: Scientific Instruments, 1976