Deposition of α-Al2O3 hard coatings by reactive magnetron sputtering
- 30 April 2004
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 185 (2-3) , 166-171
- https://doi.org/10.1016/j.surfcoat.2003.11.017
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Low temperature deposition of α-Al2O3 thin films by sputtering using a Cr2O3 templateJournal of Vacuum Science & Technology A, 2002
- Simplified method for analyzing nanoindentation data and evaluating performance of nanoindentation instrumentsJournal of Materials Research, 2001
- Characterization of α-phase aluminum oxide films deposited by filtered vacuum arcSurface and Coatings Technology, 2001
- Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputteringPublished by Elsevier ,2001
- Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputteringSurface and Coatings Technology, 1999
- Correlation between structure and properties of reactively deposited Al2O3 coatings by pulsed magnetron sputteringSurface and Coatings Technology, 1997
- Crystalline alumina deposited at low temperatures by ionized magnetron sputteringJournal of Vacuum Science & Technology A, 1997
- Preparation of alumina coatings by chemical vapour depositionThin Solid Films, 1986
- Alumina deposition by activated reactive evaporationThin Solid Films, 1977
- Transitions in Vapor‐Deposited Alumina from 300° to 1200°CJournal of the American Ceramic Society, 1967