Implanted arsenic and boron concentration profiles in SiO2 layers

This publication has 13 references indexed in Scilit:

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• Ranges and Distributions of Ions Implanted in Dielectrics
  Published by Springer Nature ,1973
• Experimental Analysis of Concentration Profiles of Boron Implanted in Silicon
  Published by Springer Nature ,1973
• Heavy-ion range profiles and associated damage distributions
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• The Influence of the Amorphous Phase on Ion Distributions and Annealing Behavior of Group III and Group V Ions Implanted into Silicon
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• Radiotracer Studies of Ion Implanted Profile Build-Up in Silicon Substrates
  Journal of the Electrochemical Society, 1968