Reflection high-energy electron diffraction intensity oscillations during Si growth on Ge(001) by solid source/molecular beam epitaxy
- 1 May 1998
- journal article
- Published by Elsevier in Surface Science
- Vol. 402-404, 304-307
- https://doi.org/10.1016/s0039-6028(97)01049-2
Abstract
No abstract availableKeywords
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