Thin-film wafer fusion for buried-heterostructure InP-based lasers fabricated on a GaAs substrate
- 15 March 2000
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 87 (6) , 2857-2866
- https://doi.org/10.1063/1.372269
Abstract
No abstract availableThis publication has 34 references indexed in Scilit:
- Long-wavelength (1.55-μm) vertical-cavity lasers with InGaAsP/InP-GaAs/AlAs DBR's by wafer fusionIEEE Journal of Quantum Electronics, 1998
- Characteristics of InAsP/InGaAsP edge emitting laserdiodes obtained by localisedfusion on GaAs substratesElectronics Letters, 1997
- Characterization of wafer bonded photodetectors fabricated using various annealing temperatures and ambientsApplied Physics Letters, 1997
- Submilliamp 1.3 µm vertical-cavity surface-emittinglasers with threshold current density of < 500 A/cm 2Electronics Letters, 1997
- Thermal processing of strained InGaAs/GaAs quantum well heterostructures bonded to Si via an epitaxial lift-off techniqueApplied Physics Letters, 1997
- Bias-free 1 Gbit/s data transmission using singlemodeGaAs VCSELs at λ = 835 nmElectronics Letters, 1996
- Wafer bonding of 50-mm diameter GaP to AlGaInP-GaP light-emitting diode wafersApplied Physics Letters, 1996
- 1.55 µm vertical-cavity surface-emitting laserswith wafer-fused InGaAsP/InP-GaAs/AlAs DBRsElectronics Letters, 1996
- Silicon heterointerface photodetectorApplied Physics Letters, 1996
- Generalized formula for curvature radius and layer stresses caused by thermal strain in semiconductor multilayer structuresJournal of Applied Physics, 1983