InAlAs/InP modulation doped heterostructures by atmospheric pressure metalorganic chemical vapor deposition using tertiarybutylphosphine
- 23 November 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (21) , 2572-2574
- https://doi.org/10.1063/1.108130
Abstract
Undoped and modulation doped InAlAs/InP heterostructures with excellent optical and electrical characteristics are demonstrated using tertiarybutylphosphine (TBP). Low-temperature photoluminescence spectra showed the presence of a type II interface transition indicating the high quality of the interface. Two-dimensional electron gas transport in a modulation doped sample containing a sheet density of 1.8×1012 cm−2 was verified by observing plateaus in the quantum Hall effect. These results confirmed that TBP can be substituted for phosphine for the growth of high quality InAlAs/InP heterostructures.Keywords
This publication has 12 references indexed in Scilit:
- Residual donor and acceptor incorporation in InP grown using trimethylindium and tertiarybutylphosphineJournal of Applied Physics, 1992
- High-purity InP layer grown by metalorganic chemical vapor deposition using tertiarybutylphosphineApplied Physics Letters, 1991
- High electron mobility in modulation-doped n-AlInAs/InP heterostructures grown by low pressure organometallic vapor phase epitaxyApplied Physics Letters, 1991
- High mobility AlInAs/InP high electron mobility transistor structures grown by organometallic vapor phase epitaxyApplied Physics Letters, 1991
- 0.33- mu m gate-length millimeter-wave InP-channel HEMTs with high f/sub 1/ and f/sub max/IEEE Electron Device Letters, 1991
- Selectively Doped n-InAlAs/InP Heterostructures Grown by MOCVDJapanese Journal of Applied Physics, 1990
- Modulation-doped AlInAs/InP heterostructures grown by organometallic vapor phase epitaxyApplied Physics Letters, 1990
- Characterization of InP Grown by OMVPE Using Tertiary-butylphosphine for the Phosphorous SourceJapanese Journal of Applied Physics, 1990
- Photoluminescence from AlInAs/InP quantum wells grown by organometallic vapor phase epitaxyApplied Physics Letters, 1988
- High quality InP layers grown by organometallic vapor phase epitaxy using tertiarybutylphosphine and phosphineApplied Physics Letters, 1988