Extraction of the oxide charges at the silicon substrate interface in Silicon-On-Insulator MOSFET's
- 1 November 1999
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 43 (11) , 2039-2046
- https://doi.org/10.1016/s0038-1101(99)00178-1
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Fully-depleted SOI CMOS for analog applicationsIEEE Transactions on Electron Devices, 1998
- Introduction to Silicon On Insulator materials and devicesMicroelectronic Engineering, 1997
- Analytical modeling of the substrate influences on accumulation-mode SOI pMOSFETs at room temperature and at liquid nitrogen temperatureSolid-State Electronics, 1997
- Analytical modeling of the substrate effect on accumulation-mode SOI pMOSFETs at room temperature and at 77 KMicroelectronic Engineering, 1997
- Substrate influences on fully depleted enhancement mode SOI MOSFETs at room temperature and at 77 KSolid-State Electronics, 1997
- Subthreshold slope of long-channel, accumulation-mode p-channel SOI MOSFETsSolid-State Electronics, 1994
- A model for analyzing the interface properties of a semiconductor-insulator-semiconductor structure. I. Capacitance and conductance techniquesIEEE Transactions on Electron Devices, 1992
- A model for analyzing the interface properties of a semiconductor-insulator-semiconductor structure. II. Transient capacitance techniqueIEEE Transactions on Electron Devices, 1992
- Model for the potential drop in the silicon substrate for thin-film SOI MOSFETsElectronics Letters, 1990
- Threshold voltage of thin-film Silicon-on-insulator (SOI) MOSFET'sIEEE Transactions on Electron Devices, 1983