Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher
- 1 August 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 8 (3) , 286-297
- https://doi.org/10.1109/66.401003
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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