Use of MOS structures for the investigation of low-dose-rate effects in bipolar transistors
- 1 December 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 42 (6) , 1660-1666
- https://doi.org/10.1109/23.488763
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Effect of electron traps on reversibility of annealingIEEE Transactions on Nuclear Science, 1995
- Physically based comparison of hot-carrier-induced and ionizing-radiation-induced degradation in BJTsIEEE Transactions on Electron Devices, 1995
- Dependence of total dose response of bipolar linear microcircuits on applied dose rateIEEE Transactions on Nuclear Science, 1994
- Bounding the total-dose response of modern bipolar transistorsIEEE Transactions on Nuclear Science, 1994
- Dose-rate effects on radiation-induced bipolar junction transistor gain degradationApplied Physics Letters, 1994
- Hardness-assurance and testing issues for bipolar/BiCMOS devicesIEEE Transactions on Nuclear Science, 1993
- Charge separation for bipolar transistorsIEEE Transactions on Nuclear Science, 1993
- Trends in the total-dose response of modern bipolar transistorsIEEE Transactions on Nuclear Science, 1992
- Tunneling and thermal emission of electrons from a distribution of shallow traps in SiO2Applied Physics Letters, 1991
- Excess surface currents in p-n junctions and bipolar transistorsSolid-State Electronics, 1971