Effect of N2-to-TiCl4 flow rate ratio on the properties of TiN coatings formed by d.c. discharge plasma-assisted chemical vapor deposition
- 1 January 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 195 (1-2) , 77-88
- https://doi.org/10.1016/0040-6090(91)90260-5
Abstract
No abstract availableKeywords
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