Spectroscopic study of plasma-enhanced organometallic chemical vapor deposition for superconducting thin film formation
- 1 August 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (3) , 1151-1156
- https://doi.org/10.1063/1.346710
Abstract
Plasma-enhanced organometallic chemical vapor deposition process has been developed to prepare high Tc superconducting films. The volatile organic precursors of Y(fod)3, Ba(hfa)2, and Cu(hfa)2 were decomposed with a microwave discharge plasma. Optical emission spectroscopy was used to determine the identity of the species produced during the vaporization and decomposition process. In this process, Y, Y+, Ba, Ba+, Cu, and Cu+ species were detected. After annealing in air, the films deposited on the (100) SrTiO3 substrate had preferential orientation of the crystalline c-axis perpendicular to the substrate surface. The characterization of this process is discussed comparing a hollow cathode YBaCuO plasma with the laser ablation experiments published.This publication has 13 references indexed in Scilit:
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