Rapid thermal processing reliability of titanium silicide implanted with arsenic, boron and phosphorus
- 1 November 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 53, 377-382
- https://doi.org/10.1016/0169-4332(91)90289-v
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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