New ways to measure the work function difference in MOS structures
- 1 January 1982
- journal article
- Published by EDP Sciences in Revue de Physique Appliquée
- Vol. 17 (8) , 473-480
- https://doi.org/10.1051/rphysap:01982001708047300
Abstract
Two new techniques for contact potential difference determination in MOS structures have been developed. These techniques were applied in practice yielding ΦMS values remaining in close agreement with each other, and within the range of ΦMS values obtained by other authors. These techniques are simple and much easier in application then the commonly used methods of ΦMS determinationKeywords
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