Superhard nanocomposite Ti1−Al N films prepared by magnetron sputtering
- 1 April 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 365 (1) , 104-109
- https://doi.org/10.1016/s0040-6090(00)00653-2
Abstract
No abstract availableKeywords
Funding Information
- Ministerstvo Školství, Mládeže a Tělovýchovy (ME 173/1999, VS 96059)
- Grantová Agentura České Republiky (106/96/K245)
This publication has 15 references indexed in Scilit:
- Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputteringPublished by Elsevier ,2002
- Nanocrystalline and nanocomposite CrCu and CrCu–N films prepared by magnetron sputteringSurface and Coatings Technology, 1999
- Recent progress in the superhard nanocrystalline composites: towards their industrialization and understanding of the origin of the superhardnessSurface and Coatings Technology, 1998
- Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N filmsThin Solid Films, 1997
- XRD Characterization of thin films with low intensity reflection linesVacuum, 1996
- Formation of high temperature phases in sputter deposited Ti-based films below 100 °CJournal of Vacuum Science & Technology A, 1996
- Reactive unbalanced magnetron sputtering of the nitrides of Ti, Zr, Hf, Cr, Mo, Ti-Al, Ti-Zr and Ti-Al-VSurface and Coatings Technology, 1993
- Structure and properties of (Ti1−Al )N films prepared by reactive sputteringThin Solid Films, 1993
- The development of the PVD coating TiAlN as a commercial coating for cutting toolsSurface and Coatings Technology, 1991
- Material selection for hard coatingsJournal of Vacuum Science & Technology A, 1986