In-situ observation of chemical vapour deposition growth of epitaxial SiGe thin films by reflexion supported pyrometric interferometry
- 1 January 1995
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 146 (1) , 119-124
- https://doi.org/10.1016/0022-0248(94)00481-1
Abstract
No abstract availableKeywords
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