The role of metal and passivation defects in electromigration-induced damage in thin film conductors
- 1 July 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 93 (3-4) , 385-395
- https://doi.org/10.1016/0040-6090(82)90144-4
Abstract
No abstract availableKeywords
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