Thin film metallization studies and device lifetime prediction using AlSi and AlCuSi conductor test bars
- 1 January 1981
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 21 (4) , 513-527
- https://doi.org/10.1016/0026-2714(81)90242-0
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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