P-channel MOSFET's with ultrathin N/sub 2/O gate oxides
- 1 February 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 13 (2) , 111-113
- https://doi.org/10.1109/55.144975
Abstract
The performance and reliability of p-channel MOSFETs utilizing ultrathin ( approximately 62 AA) gate dielectrics grown in pure N/sub 2/O ambient are reported. Unlike (reoxidized) NH/sub 3/-nitrided oxide devices, p-MOSFETs with N/sub 2/O-grown oxides show improved performance in both linear and saturation regions compared to control devices with gate oxides grown in O/sub 2/. Because both electron and hole trapping are suppressed in N/sub 2/O-grown oxides, the resulting p-MOSFETs show considerably enhanced immunity to channel hot-electron and -hole-induced degradation (e.g., hot-electron-induced punchthrough).Keywords
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