Fabrication and Evaluation of X-Ray Multilayer Mirrors Prepared by Laser-Induced Chemical Vapor Deposition

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Abstract
This study demonstrates a new preparation process for fabricating X-ray multilayer mirrors. Tungsten/carbon multilayer mirrors were prepared using laser-induced chemical vapor deposition (laser-CVD). The structure and properties of the mirror were examined using X-ray diffraction, synchrotron radiation and transmission electron microscopy (TEM) measurements. The reflectivity at a grazing angle of 14.5 degrees was observed to be 4.1% at a wavelength of 5 nm. The reflectivity was lower than the ideal reflectivity. The reduction in the reflectivity was caused by the lower-density film (tungsten layer), interface roughness and diffuse interfaces. Furthermore, after annealing at room temperature for two months, the increment of the period of this mirror was about 33%. This was due to the oxidation of tungsten films in W/C (tungsten/carbon multilayer mirror).