Abstract
Room‐temperature operation of Ga(1−x)AlxAs/Ga(1−y)AlyAs double‐heterostructure lasers grown by metalorganic chemical vapor deposition (MO‐CVD) has been achieved. These devices have Ga(1−y)AlyAs active layers of 0.8≲y≲0.12 and emit in the wavelength range 8000<λ2 have been fabricated. These lasers are produced from five‐layer epitaxial structures grown entirely by the MO‐CVD process and are the first such devices to be fabricated from materials grown by a vapor‐phase process.