Progress in the chemistry of organosilicon resists
- 1 January 1994
- journal article
- Published by Wiley in Polymers for Advanced Technologies
- Vol. 5 (1) , 70-78
- https://doi.org/10.1002/pat.1994.220050110
Abstract
No abstract availableKeywords
This publication has 60 references indexed in Scilit:
- Study on organosilicon positive resist. II. Organosilicon positive photoresist (OSPR–1334) and its application to bilayer resist systemJournal of Applied Polymer Science, 1992
- Insolubilization mechanism of a chemical amplification negative-resist system utilizing an acid-catalyzed silanol condensation reactionChemistry of Materials, 1991
- Preparation and properties of Si-containing copolymer for near-UV resist. I. Poly(N-(4-hydroxyphenyl) maleimidealt-p-trimethylisilylstyrene)Journal of Polymer Science Part A: Polymer Chemistry, 1991
- Chemical amplification of resist lines (CARL)Microelectronic Engineering, 1990
- Silylation of resist materials using di- and polyfunctional organosilicon compoundsMicroelectronic Engineering, 1990
- Acid-catalyzed silanol condensation reaction mechanism in a chemical amplification negative resist system.Journal of Photopolymer Science and Technology, 1990
- Oxide formation during plasma etching of silicon-containing resistsApplied Physics Letters, 1989
- Photosensitive organosilicon polymers for microlithographic applicationMakromolekulare Chemie. Macromolecular Symposia, 1989
- Organosilicon polymers for lithographic applicationsMakromolekulare Chemie. Macromolecular Symposia, 1989
- The synthesis and lithographic evaluation of a new organosilicon novolac-based resistJournal of Polymer Science Part A: Polymer Chemistry, 1988